Local Diffusion Induced Roughening in Cobalt Phthalocyanine Thin Film Growth

被引:20
|
作者
Gedda, Murali [1 ]
Subbarao, Nimmakayala V. V. [2 ]
Goswami, Dipak K. [3 ]
机构
[1] Indian Inst Technol Guwahati, Dept Phys, Gauhati 781039, India
[2] Indian Inst Technol Guwahati, Ctr Nanotechnol, Gauhati 781039, India
[3] Indian Inst Technol, Dept Phys, Kharagpur 721302, W Bengal, India
关键词
LIGHT-EMITTING-DIODES; MORPHOLOGY; METALLOPHTHALOCYANINES; TEMPERATURE;
D O I
10.1021/la502108a
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
We have studied the kinetic roughening in the growth of cobalt phthalocyanine (CoPc) thin films grown on SiO2/Si(001) surfaces as a function of the deposition time and the growth temperature using atomic force microscopy (AFM). We have observed that the growth exhibits the formation of irregular islands, which grow laterally as well as vertically with coverage of CoPc molecules, resulting rough film formation. Our analysis further disclosed that such formation is due to an instability in the growth induced by local diffusion of the molecules following an anomalous scaling behavior. The instability relates the (In(t))(1/2), with t as deposition time, dependence of the local surface slope as described in nonequilibrium film growth. The roughening has been characterized by calculating different scaling exponents alpha, beta, and 1/z determined from the height fluctuations obtained from AFM images. We obtained an average roughness exponent alpha = 0.78 +/- 0.04. The interface width (W) increases following a power law as W similar to t(beta), with growth exponent beta = 0.37 +/- 0.05 and lateral correlation length (xi) grows as xi similar to t(1/z) with dynamic exponent 1/z = 0.23 +/- 0.06. The exponents revealed that the growth belongs to a different class of universality.
引用
收藏
页码:8735 / 8740
页数:6
相关论文
共 50 条
  • [41] THE EFFECTS OF SURFACE-DIFFUSION ON THE GROWTH OF THIN-FILM
    LEE, YL
    MAA, JR
    INTERNATIONAL COMMUNICATIONS IN HEAT AND MASS TRANSFER, 1991, 18 (04) : 479 - 494
  • [42] SOLUTION GROWTH TECHNIQUE FOR THE DEPOSITION OF COBALT SULFIDE THIN-FILM
    BASU, PK
    PRAMANIK, P
    JOURNAL OF MATERIALS SCIENCE LETTERS, 1986, 5 (12) : 1216 - 1218
  • [43] Local magnetostriction measurement in a cobalt thin film using scanning probe microscopy
    Kim, Kwang-Eun
    Yang, Chan-Ho
    AIP ADVANCES, 2018, 8 (10)
  • [44] A SOLUTION GROWTH TECHNIQUE FOR THE DEPOSITION OF COBALT SELENIDE THIN-FILM
    PRAMANIK, P
    BHATTACHARYA, S
    BASU, PK
    THIN SOLID FILMS, 1987, 149 (03) : L81 - L84
  • [45] Thin-film growth behavior of non-planar vanadium oxide phthalocyanine
    Liu, Tian-Jiao
    Xia, Hua-Yan
    Liu, Biao
    Jones, Tim S.
    Fang, Mei
    Yang, Jun-Liang
    CHINESE PHYSICS B, 2019, 28 (08)
  • [46] Kinetic roughening in polymer film growth by vapor deposition
    Zhao, YP
    Fortin, JB
    Bonvallet, G
    Wang, GC
    Lu, TM
    PHYSICAL REVIEW LETTERS, 2000, 85 (15) : 3229 - 3232
  • [47] Thin-film growth behavior of non-planar vanadium oxide phthalocyanine
    刘天娇
    夏华艳
    刘标
    Tim S Jones
    方梅
    阳军亮
    Chinese Physics B, 2019, 28 (08) : 373 - 379
  • [48] Preparation and polymorphism of thin films of unsubstituted cobalt phthalocyanine
    Bottger, B
    Schindewolf, U
    Mobius, D
    Avila, JL
    Martin, MT
    Rodriguez-Amaro, R
    LANGMUIR, 1998, 14 (18) : 5188 - 5194
  • [49] Electrochemical Roughening of Thin-Film Platinum Macro and Microelectrodes
    Ivanovskaya, Anna N.
    Belle, Anna M.
    Yorita, Allison
    Qian, Fang
    Chen, Supin
    Tooker, Angela
    Lozada, Rose Garcia
    Dahlquist, Dylan
    Tolosa, Vanessa
    JOVE-JOURNAL OF VISUALIZED EXPERIMENTS, 2019, (148):
  • [50] Reversible electrochromism of copper phthalocyanine thin film
    Toshima, N
    Tominaga, T
    Kawamura, S
    BULLETIN OF THE CHEMICAL SOCIETY OF JAPAN, 1996, 69 (01) : 245 - 253