Pulsed laser deposition of Cu:Al2O3 nanocrystal thin films with high third-order optical susceptibility

被引：118
|
作者：
Ballesteros, JM
Serna, R
Solis, J
Afonso, CN
PetfordLong, AK
Osborne, DH
Haglund, RF
机构：
[1] UNIV OXFORD,DEPT MAT,OXFORD OX1 3PH,ENGLAND
[2] VANDERBILT UNIV,DEPT PHYS & ASTRON,NASHVILLE,TN 37235
来源：
APPLIED PHYSICS LETTERS | 1997年 / 71卷 / 17期
关键词：
D O I：
10.1063/1.120117
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Nanocomposite films comprising metal Cu nanocrystals embedded in an Al2O3 matrix were deposited by alternating pulsed laser ablation from metallic Cu and ceramic Al2O3 targets. The films were grown in vacuum on glass substrates held at room temperature. The as-grown films contain 4 nm Cu nanocrystals in an amorphous Al2O3 matrix, with a total thickness of 190 nm. The films show a substantial third-order susceptibility with an electronic nonlinear refractive index of (2.93 +/- 1.08).10(-10) cm(2) W-1 and a nonlinear saturation of -(2.34 +/- 0.18).10(-5) cm W-1. (C) 1997 American Institute of Physics. [S0003-6951(97)03743-1].
引用
收藏
页码：2445 / 2447
页数：3
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