Sub-nanometer metrology of chirped phase masks by optical Moire

被引:4
|
作者
Barnier, F
Dyer, PE [1 ]
Snelling, HV
De la Rue, RM
机构
[1] Univ Hull, Dept Phys, Hull HU6 7RX, N Humberside, England
[2] Univ Glasgow, Dept Elect & Elect Engn, Glasgow G12 8LT, Lanark, Scotland
基金
英国工程与自然科学研究理事会;
关键词
D O I
10.1016/S0030-4018(99)00461-7
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Optical Moire fringe formation between a linear and chirped phase mask has been investigated theoretically and experimentally and used to determine the chirp rate. Period difference determination down to similar to 0.4 nm is demonstrated using a 1080 nm period linear grating and a nominally 1 nm/mm chirped grating. Direct optical diffraction is also used to independently assess the chirp rate. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:175 / 179
页数:5
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