Sub-nanometer metrology of optical wafers using an angle-scanned Fabry-Perot interferometer

被引:9
|
作者
Arkwright, J [1 ]
Farrant, D [1 ]
Zhang, J [1 ]
机构
[1] Harbin Inst Technol, Heilongjiang, Peoples R China
来源
OPTICS EXPRESS | 2006年 / 14卷 / 01期
关键词
D O I
10.1364/OPEX.14.000114
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
An rms measurement repeatability of <= 0.07 nm and a reproducibility of <= 0.16 are reported from a series of thickness measurements made on a 280 mu m thick, 37.5 mm diameter lithium niobate wafer. The measurements were taken on a custom made metrology rig based on accurate rotation of a Fabry-Perot etalon structure in a collimated beam from a wavelength stabilized Helium Neon laser. The measurements were made on different days with the wafer in three different orientations. (c) 2006 Optical Society of America.
引用
收藏
页码:114 / 119
页数:6
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