Electron-beam deposition of magneto-dielectric coatings in the forevacuum pressure range

被引：3

作者：

Zolotukhin, D. B. ^{[1
]}

Klimov, A. A. ^{[1
]}

Oks, E. M. ^{[1
]}

Tyunkov, A. V. ^{[1
]}

Yushkov, Yu. G. ^{[1
]}

Zenin, A. A. ^{[1
]}

机构：

[1] Tomsk State Univ Control Syst & Radioelect, 40 Lenin Ave, Tomsk 634050, Russia

来源：

VACUUM | 2021年 / 184卷

基金：

俄罗斯基础研究基金会;

关键词：

Magnetic thin films; Coatings; Electron beam evaporation; Forevacuum plasma-cathode electron sources; THIN-FILMS; SUBSTRATE;

D O I：

10.1016/j.vacuum.2020.109944

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We synthesized magneto-dielectric coatings in the pressure range of 1-10 Pa using sequential electron-beam evaporation of alumina ceramic and ferrite targets. The electron-beam evaporation of targets with low electrical conductivity is made possible due to the neutralization of the electrical charging of the targets by the beam plasma ions. We investigated the evolution of the mass-to-charge composition of plasma ions with increasing target temperature and measured the electrical (frequency dependencies of capacitance, dielectric loss angle and impedance) and magnetic (real and imaginary parts of the relative magnetic permeability) characteristics of the coatings.

引用

页数：6

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