Increased Laser Damage Threshold in As2S3 Motheye Antireflective Structures

被引：0
|
作者：
Weiblen, R. Joseph [1 ]
Florea, Catalin [2 ]
Busse, Lynda [3 ]
Shaw, Brandon [3 ]
Menyuk, Curtis. R. [1 ]
Aggarwal, Ishwar [2 ]
Sanghera, Jasbinder [3 ]
机构：
[1] Univ Maryland Baltimore Cty, Baltimore, MD 21250 USA
[2] Sotera Def Solut, Annapolis Jct, MD 20701 USA
[3] Naval Res Lab, Washington, DC 20375 USA
来源：
2014 CONFERENCE ON LASERS AND ELECTRO-OPTICS (CLEO) | 2014年
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D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
We computationally study the irradiance enhancement in As2S3 motheye structures. We show that enhancement in the glass is minimal, matching with experiments showing an increased laser damage threshold for motheye structures versus thin-film AR coatings. (c) 2014 Optical Society of America
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