Discharge and Plasma Characteristics of Pulse-Enhanced Vacuum Arc Evaporation (PEVAE) for Titanium Cathode

被引:10
|
作者
Ma, Yinghe [1 ]
Gong, Chunzhi [1 ]
Tian, Qinwen [2 ]
Chu, Paul K. [3 ]
Golosov, Dmitriy A. [4 ]
Tian, Xiubo [1 ]
机构
[1] Harbin Inst Technol, State Key Lab Adv Welding & Joining, Harbin 150001, Heilongjiang, Peoples R China
[2] Jiamusi Univ, Sch Mat Sci & Engn, Jiamusi 154007, Peoples R China
[3] City Univ Hong Kong, Dept Phys & Mat Sci, Hong Hom, Hong Kong, Peoples R China
[4] Belarusian State Univ Informat & Radioelect, Thin Film Res Lab, Minsk 220013, BELARUS
关键词
Electron emission; optical emission spectra; pulse-enhanced vacuum arc evaporation (PEVAE); substrate current; vacuum arc; OPTICAL-EMISSION SPECTROSCOPY; CURRENT-DENSITY; DEPOSITION; PARAMETERS; PRESSURE; GAS; DISTRIBUTIONS; DEPENDENCE; COATINGS; TIN;
D O I
10.1109/TPS.2018.2801333
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
This paper reports experimental investigation of the discharge behavior of pulse-enhanced vacuum arc evaporation (PEVAE) with titanium target. The PEVAE discharge was analyzed by optical emission spectroscopy, monitoring of substrate current and the electron probe current at different N-2 pressure or arc current, respectively, compared to that of conventional dc arc. The results show that during the PEVAE process the electron probe current was significantly enhanced particularly at a higher pulsed current. An increase of up to more than 1-2 times was observed. Electron emission was substantially enhanced. The substrate current increased linearly with arc current regardless of the dc or PEVAE mode; however, the latter led to a larger current-rise slope. The substrate current with the PEVAE mode was improved to over 7 times. The optical emission spectra of plasma at nitrogen atmosphere showed that the intensities of ion species (e.g., Ti2+, Ti+, N+, N-2(+)) gradually increased with pulsed arc current for the PEVAE mode. Electron temperature derived from Ti+ ion spectra was 0.55-0.6 eV and changed slightly in the PEVAE mode or dc mode. The increase in plasma spectral intensity is caused by the plasma density increase from larger ion density. These results imply that PEVAE may be an effective technique for film deposition of better microstructure and properties due to higher substrate current induced by larger electron emission and plasma density.
引用
收藏
页码:2619 / 2625
页数:7
相关论文
共 50 条
  • [11] The acceleration of a cathode-jet plasma in a pulse vacuum discharge
    Gorbunov, SP
    Krasov, VI
    Paperny, VL
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1997, 30 (13) : 1922 - 1927
  • [12] Characteristics of plasma flow from a pulse vacuum arc
    Paperny, V. L.
    Chernikh, A. A.
    ISDEIV 2008: PROCEEDINGS OF THE XXIIIRD INTERNATIONAL SYMPOSIUM ON DISCHARGES AND ELECTRICAL INSULATION IN VACUUM, VOLS 1 AND 2, 2008, : 307 - 309
  • [13] Enhancement of discharge and mechanical properties of ta-C films by pulse-enhanced cathodic arc deposition
    Wang, Benfu
    Tian, Xiubo
    Hu, Jian
    Gong, Chunzhi
    Liu, Xiangli
    Li, Jin
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2023, 41 (03):
  • [14] Investigation of the character of erosion of the cathode surface exposed to the vacuum pulse arc discharge
    Bushik, AI
    Bakuto, IA
    Shilov, VA
    Zachepilo, PS
    Bushik, SV
    ISDEIV - XVIITH INTERNATIONAL SYMPOSIUM ON DISCHARGES AND ELECTRICAL INSULATION IN VACUUM, PROCEEDINGS, VOLS I AND II, 1996, : 796 - 798
  • [15] PRESSURE-DEPENDENCE OF PLASMA PARAMETERS IN MEDIUM-VACUUM NITROGEN ARC-DISCHARGE WITH THE TITANIUM CATHODE
    SAKAKI, M
    SAKAKIBARA, T
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 1991, 19 (01) : 25 - 28
  • [16] Investigation of the character of cathode spot movement at vacuum pulse arc discharge.
    Bushik, AI
    Bakuto, IA
    Mitskevich, MK
    Zachepilo, PS
    Bushik, SV
    ISDEIV - XVIITH INTERNATIONAL SYMPOSIUM ON DISCHARGES AND ELECTRICAL INSULATION IN VACUUM, PROCEEDINGS, VOLS I AND II, 1996, : 185 - 187
  • [17] Development of a Magnetic System to Stabilize the Extended Evaporation Zone at the Cathode of the Vacuum Arc Discharge in Ion–Plasma MAP Plants
    S. A. Budinovskii
    S. A. Muboyadzhyan
    A. A. Lyapin
    A. S. Benklyan
    Russian Metallurgy (Metally), 2021, 2021 : 696 - 702
  • [18] Experimental characteristics of vacuum arc discharge inside the hollow cathode.
    Galkin, SG
    Cherednichenko, MV
    KORUS-2002: 6TH RUSSIAN-KOREAN INTERNATIONAL SYMPOSIUM ON SCIENCE AND TECHNOLOGY, PROCEEDINGS, 2002, : 219 - 221
  • [19] Plasma jet characteristics in vacuum arc with diffused cathode spot
    Amirov, R. Kh
    Vorona, N. A.
    Gavrikov, A. V.
    Liziakin, G. D.
    Polistchook, V. P.
    Samoylov, I. S.
    Smirnov, V. P.
    Usmanov, R. A.
    Yartsev, I. M.
    5TH INTERNATIONAL CONGRESS ON ENERGY FLUXES AND RADIATION EFFECTS 2016, 2017, 830
  • [20] EVAPORATION OF SILICON BY VACUUM-ARC DISCHARGE
    NAOE, M
    YAMANAKA, S
    JAPANESE JOURNAL OF APPLIED PHYSICS, 1969, 8 (02) : 287 - &