A possible mechanism for improved light-induced degradation in deuterated amorphous-silicon alloy

被引:39
|
作者
Wei, JH
Sun, MS
Lee, SC
机构
[1] Department of Electrical Engineering, National Taiwan University, Taipei
关键词
D O I
10.1063/1.119972
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have studied light-induced photoconductivity degradation in an intrinsic hydrogenated and deuterated amorphous-silicon (a-Si) alloy. Deuterated a-Si turns out to be more stable under light exposure. A possible mechanism is proposed to explain this phenomenon. It is attributed to the highly efficient coupling between the localized Si-D wagging modes (similar to 510 cm(-1)) and the extended Si-Si lattice vibration modes (similar to 495 cm(-1)). The energy released from electron or hole capture at silicon dangling bonds causes localized vibrations of nearby Si-D bonds. The energy dissipates quickly to the background lattice and a higher recombination rate at local sites is needed in deuterated a-Si than in hydrogenated amorphous silicon to accumulate enough energy to break the nearby weak bonds. (C) 1997 American Institute of Physics.
引用
收藏
页码:1498 / 1500
页数:3
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