Adaptive high-resolution Linnik interferometry for 3D measurement of microparticles

被引：5
|
作者：
Allendorf, Benedikt [1 ]
Kaekel, Eireen [2 ]
Ha, Uh-Myong [2 ]
Hagemeier, Sebastian [1 ]
Hillmer, Hartmut [2 ]
Lehmann, Peter [1 ]
机构：
[1] Univ Kassel, Dept Elect Engn & Comp Sci, Measurement Technol, Wilhelmshoher Allee 71, D-34121 Kassel, Germany
[2] Univ Kassel, Inst Nanostruct Technol & Analyt, Heinrich Plett Str 40, D-34132 Kassel, Germany
来源：
OPTICS LETTERS | 2019年 / 44卷 / 14期
关键词：
LIGHT INTERFERENCE MICROSCOPY;
D O I：
10.1364/OL.44.003550
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
Tailored 3D microparticles and nanostructures lead to increasing possibilities in semiconductor industry or biomedical applications. In an interdisciplinary study we investigate the parallel production of such partides by using nanoimprint lithography in combination with their characterization based on interference microscopy. In this Letter we report on a metrological inspection, which tends to a universal measurement solution comparing the sample optically to a master object produced in the same way as the sample. (C) 2019 Optical Society of America
引用
收藏
页码：3550 / 3553
页数：4
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