Measurement of polarization charge and conduction-band offset at InxGa1-xN/GaN heterojunction interfaces

被引:130
|
作者
Zhang, H [1 ]
Miller, EJ
Yu, ET
Poblenz, C
Speck, JS
机构
[1] Univ Calif San Diego, Dept Elect & Comp Engn, La Jolla, CA 92093 USA
[2] Univ Calif Santa Barbara, Dept Mat, Santa Barbara, CA 93106 USA
关键词
D O I
10.1063/1.1759388
中图分类号
O59 [应用物理学];
学科分类号
摘要
The spontaneous and piezoelectric polarization fields in group-III nitride semiconductors lead to the presence of large electrostatic sheet charge densities at nitride semiconductor heterojunction interfaces. Precise quantitative knowledge of these polarization-induced charge densities and of the band-edge discontinuities at nitride heterojunction interfaces is therefore essential in nitride semiconductor device design and analysis. We have used capacitance-voltage profiling to measure the conduction-band offset and polarization charge density at InxGa1-xN/GaN heterojunction interfaces with x=0.054 and x=0.09. We obtain conduction-band offsets DeltaE(C)=0.09+/-0.07 eV for x=0.054 and DeltaE(C)=0.22+/-0.05 eV for x=0.09, corresponding to an averaged conduction-to-valence-band offset ratio DeltaE(C):DeltaE(V) of 58:42. Our measurements yield polarization charge densities of (1.80+/-0.32)x10(12) e/cm(2) for x=0.054 and (4.38+/-0.36)x10(12) e/cm(2) for x=0.09. These values are smaller than those predicted by recent theoretical calculations, but in good agreement with values inferred from a number of optical experiments. (C) 2004 American Institute of Physics.
引用
收藏
页码:4644 / 4646
页数:3
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