Low energy ion beam assisted deposition of biaxially aligned YSZ and CeO2/YSZ films on r-plane sapphire

被引:4
|
作者
Mu, HC
Ren, CX
Jiang, BY
Yu, YH
Luo, EZ
Wilson, ZH
机构
[1] Chinese Acad Sci, Shanghai Inst Met, Ion Beam Lab, Shanghai 200050, Peoples R China
[2] Chinese Univ Hong Kong, Mat Sci & Technol Res Ctr, Hong Kong, Hong Kong, Peoples R China
来源
SURFACE & COATINGS TECHNOLOGY | 2000年 / 124卷 / 01期
基金
中国国家自然科学基金;
关键词
biaxially aligned; ion beam assisted deposition; r-plane sapphire substrate; YSZ and CeO2/YSZ thin films;
D O I
10.1016/S0257-8972(99)00622-2
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
(001) oriented yttria-stabilized zirconia (YSZ) and CeO2/YSZ multilayer films with high in-plane biaxial texture have been deposited on an r-plane sapphire substrate by ion beam assisted deposition (IBAD) at ambient temperature. The optimal in-plane texture, whose full width at half maximum (FWHM) of X-ray (111) phi-scan peak were 15 degrees and 12 degrees for YSZ and CeO2/YSZ films respectively, could be obtained. Monte Carlo simulation results suggest that the divergence of incident bombarding ion beam is expected to have strong influence on film in-plane biaxial texture. The effect of the collimation of incident bombarding ion beam on the formation of high in-plane biaxial texture was demonstrated under certain IBAD conditions. The atomic force microscope (AFM) images indicated that the small-grained, smooth and continuous film structure of the CeO2 film is more favorable for the in-plane biaxial texture development than the large-grained and rough structure of the YSZ film. (C) 2000 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:61 / 65
页数:5
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