Growth of high-quality ZnTe layers by MOVPE

被引:15
|
作者
Gheyas, SI
Hirano, S
Nishio, M
Ogawa, H
机构
[1] SAGA UNIV, DEPT ELECT ENGN, FAC SCI & ENGN, SAGA 840, JAPAN
[2] INST MOL SCI, OKAZAKI, AICHI 444, JAPAN
关键词
D O I
10.1016/0169-4332(96)00356-X
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The effects of substrate temperature and transport rate of source materials (dimethylzinc and diethyltellurium) on the growth rate and photoluminescence properties of ZnTe layers grown on the ZnTe (100) substrate by atmospheric pressure MOVPE have been investigated. Strong free exciton emission and Y bands appear predominantly in films grown under low transport rate(e.g., 10-15 mu mol/min) and moderate temperature (e.g., 380 degrees C).
引用
收藏
页码:647 / 651
页数:5
相关论文
共 50 条
  • [1] MOVPE growth of high-quality AlN
    Dadgar, A.
    Krost, A.
    Christen, J.
    Bastek, B.
    Bertram, F.
    Krtschil, A.
    Hempel, T.
    Blaesing, J.
    Haboeck, U.
    Hoffmann, A.
    JOURNAL OF CRYSTAL GROWTH, 2006, 297 (02) : 306 - 310
  • [2] Structural and optical properties of high-quality ZnTe homoepitaxial layers
    Chang, JH
    Cho, MW
    Wang, HM
    Wenisch, H
    Hanada, T
    Yao, T
    Sato, K
    Oda, O
    APPLIED PHYSICS LETTERS, 2000, 77 (09) : 1256 - 1258
  • [3] THE GROWTH AND CHARACTERIZATION OF HIGH-QUALITY MOVPE GAAS AND GAALAS
    NAKANISI, T
    JOURNAL OF CRYSTAL GROWTH, 1984, 68 (01) : 282 - 294
  • [4] Growth and optical properties of high-quality ZnTe homoepitaxial layers by metalorganic vapor phase epitaxy
    Tanaka, T
    Hayashida, K
    Wang, SL
    Guo, QX
    Nishio, M
    Ogawa, H
    JOURNAL OF CRYSTAL GROWTH, 2003, 248 : 43 - 49
  • [5] Low pressure MOVPE growth and characterization of ZnTe homoepitaxial layers
    Nishio, Mitsuhiro
    Saito, Katsuhiko
    Abiru, Masakatsu
    Mori, Eiichiro
    Araki, Yasuhiro
    Tanaka, Daichi
    Tanaka, Tooru
    Guo, Qixin
    PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 13 NO 7-9, 2016, 13 (7-9): : 439 - 442
  • [6] Growth of high-quality AlN at high growth rate by high-temperature MOVPE
    Fujimoto, N.
    Kitano, T.
    Narita, G.
    Okada, N.
    Balakrishnan, K.
    Iwaya, M.
    Kamiyama, S.
    Amano, H.
    Akasaki, I.
    Shimono, K.
    Noro, T.
    Takagi, T.
    Bandoh, A.
    PHYSICA STATUS SOLIDI C - CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 3, NO 6, 2006, 3 (06): : 1617 - 1619
  • [7] High-quality GaN growth on AlN/sapphire templates by MOVPE
    Sakai, M
    Ishikawa, H
    Egawa, T
    Jimbo, T
    Umeno, M
    Shibata, T
    Asai, K
    Sumiya, S
    Kuraoka, Y
    Tanaka, M
    Oda, O
    COMPOUND SEMICONDUCTORS 2001, 2002, (170): : 783 - 788
  • [8] GROWTH OF HIGH-QUALITY ZNSE BY MOVPE ON (100) ZNSE SUBSTRATE
    YODO, T
    KOYAMA, T
    YAMASHITA, K
    JOURNAL OF CRYSTAL GROWTH, 1988, 86 (1-4) : 273 - 278
  • [9] MOVPE homoepitaxy of high-quality GaN: Crystal growth and devices
    Kirchner, C
    Schwegler, V
    Eberhard, F
    Kamp, M
    Ebeling, KJ
    Prystawko, P
    Leszczynski, M
    Grzegory, I
    Porowski, S
    PROGRESS IN CRYSTAL GROWTH AND CHARACTERIZATION OF MATERIALS, 2000, 41 (1-4) : 57 - 83
  • [10] THE MOVPE GROWTH AND DOPING OF ZNTE
    KUHN, W
    WAGNER, HP
    STANZL, H
    WOLF, K
    WORLE, K
    LANKES, S
    BETZ, J
    WORZ, M
    LICHTENBERGER, D
    LEIDERER, H
    GEBHARDT, W
    TRIBOULET, R
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1991, 6 (9A) : A105 - A108