Numerical simulation of an RF inductively coupled plasma for functional enhancement by seeding vaporized alkali metal

被引：21
|
作者：
Nishiyama, H [1 ]
Shigeta, M [1 ]
机构：
[1] Tohoku Univ, Inst Fluid Sci, Aoba Ku, Sendai, Miyagi 9808577, Japan
来源：
EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS | 2002年 / 18卷 / 02期
关键词：
D O I：
10.1051/epjap:2002034
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
The functions of the plasma flow such as electrical conductivity, thermal conduction and chemical reaction can be enhanced by seeding vaporized alkali metal with low ionization potential. In the present study, numerical simulation is conducted for the radio frequency inductively coupled plasma of which functions are enhanced by seeding a small amount of vaporized alkali metal. The effects of seeding, injection flow rate and applied coil frequency on the plasma characteristics are clarified by relating to the flow structure and electromagnetic effect.
引用
收藏
页码：125 / 133
页数：9
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