Optical characteristics of the plasma of a transverse volume discharge in a Ne/Ar/SiH4 mixture

Results are presented from studies of the characteristics of a transverse volume discharge in a Ne/Ar/SiH4 mixture at pressures of 5-35 kPa. It is shown that SiI 288.2-nm, H-beta 486.1-nm, and NeI 585.3-nm lines and H-2 Lyman bands can be used to monitor the process of destruction of silane molecules. The obtained porous film, consisting of the products of SiH4 destruction, is of interest for yielding siliceous fullerenes and for application in optoelectronics, (C) 2000 MAIK "Nauka/Interperiodica".