Optical characteristics of the plasma of a transverse volume discharge in a Ne/Ar/SiH4 mixture

被引：0
|
作者：
Shuaibov, AK [1 ]
机构：
[1] Uzhgorod State Univ, UA-294000 Uzhgorod, Ukraine
来源：
PLASMA PHYSICS REPORTS | 2000年 / 26卷 / 02期
关键词：
D O I：
10.1134/1.952837
中图分类号：
O35 [流体力学]; O53 [等离子体物理学];
学科分类号：
070204 ; 080103 ; 080704 ;
摘要：
Results are presented from studies of the characteristics of a transverse volume discharge in a Ne/Ar/SiH4 mixture at pressures of 5-35 kPa. It is shown that SiI 288.2-nm, H-beta 486.1-nm, and NeI 585.3-nm lines and H-2 Lyman bands can be used to monitor the process of destruction of silane molecules. The obtained porous film, consisting of the products of SiH4 destruction, is of interest for yielding siliceous fullerenes and for application in optoelectronics, (C) 2000 MAIK "Nauka/Interperiodica".
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页码：174 / 176
页数：3
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