Lithium niobate-tantalate thin films on Si by thermal plasma spray CVD

被引：10
|
作者：
Kulinich, SA
Yamamoto, H
Shibata, J
Terashima, K
Yoshida, T
机构：
[1] Univ Tokyo, Fac Engn, Dept Mat Engn, Bunkyo Ku, Tokyo 1138656, Japan
[2] Univ Tokyo, Grad Sch Frontier Sci, Dept Adv Mat Sci, Bunkyo Ku, Tokyo 1138656, Japan
[3] Univ Tokyo, Engn Res Inst, Bunkyo Ku, Tokyo 1138656, Japan
来源：
THIN SOLID FILMS | 2002年 / 407卷 / 1-2期
关键词：
growth rate; thermal plasma spray CVD; thin films; LiNb1-xTaxO3;
D O I：
10.1016/S0040-6090(02)00013-5
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Highly (006)-oriented lithium niobate-tantalate (LiNb(0.5)Tk(0.5)O(3) and LiNb0.2Ta0.bO3) thin films with submicron thickness were prepared by thermal plasma spray CVD on Si(1 0 0) substrates covered with a native oxide layer. The effect of the growth rate on film orientation and surface morphology has been studied. It was shown that both growth temperature and growth rate are responsible for producing highly (0 0 6)-textured films. The films do not exhibit any effect of the Nb/Ta ratio on their orientation. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：60 / 66
页数：7
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