Electron density gradients in ammonothermally grown Si-doped GaN

被引:1
|
作者
Cusco, Ramon [1 ]
Domenech-Amador, Nuria [1 ]
Jimenez, Juan [2 ]
Artus, Luis [1 ]
机构
[1] CSIC, Inst Jaume Almera ICTJA, E-08028 Barcelona, Catalonia, Spain
[2] Univ Valladolid, GdS Optronlab, E-47011 Valladolid, Spain
关键词
RAMAN-SCATTERING; CRYSTALS; NITRIDE; MODES;
D O I
10.7567/APEX.7.021001
中图分类号
O59 [应用物理学];
学科分类号
摘要
Charge homogeneity in heavily Si-doped ammonothermal GaN has been studied by confocal micro-Raman measurements. The polarized Raman spectra indicate a high crystalline quality of the sample. On the N-polarity growth sector we observe both branches (L+, L-) of the phonon-plasmon coupled modes. The free-electron density, which is derived from a line-shape fit to the L+ mode, displays an in-depth gradient with a decreasing density when the top surface is approached. The Raman spectra of the Ga-polarity growth sector do not show any trace of phonon-plasmon coupled modes, suggesting a lower Si incorporation and/or the presence of compensating deep levels. (C) 2014 The Japan Society of Applied Physics
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页数:4
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