Structure of clean and arsenic-covered GaN(0001) surfaces

被引:40
|
作者
Ramachandran, V
Lee, CD
Feenstra, RM
Smith, AR [1 ]
Northrup, JE
Greve, DW
机构
[1] Ohio Univ, Dept Phys & Astron, Athens, OH 45701 USA
[2] Carnegie Mellon Univ, Dept Phys, Pittsburgh, PA 15213 USA
[3] Xerox Corp, Palo Alto Res Ctr, Palo Alto, CA 94304 USA
[4] Carnegie Mellon Univ, Dept Elect & Comp Engn, Pittsburgh, PA 15213 USA
关键词
GaN; arsenic; surface; 2; x; RHEED; Auger;
D O I
10.1016/S0022-0248(99)00570-9
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The effect of trace arsenic on the growth and surface structure of GaN(0 0 0 1) has been studied. We find that a partial pressure of only 10(-9) Torr of arsenic during molecular beam epitaxial growth significantly modifies the growth kinetics. Such a small background pressure of arsenic leads to an arsenic-terminated surface displaying a 2 x 2 reconstruction during growth which is absent for the clean surface. First-principles theoretical calculations show that As-terminated surfaces an energetically more favorable than Ga-terminated surfaces for arsenic pressures of 10(-9) Torr, and structural models for the As-adatom 2 x 2 reconstruction are presented. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:355 / 363
页数:9
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