Microlens Array Fabricated by Gray-scale Lithography Maskless System

被引：2
|
作者：
Cirino, G. A. [1 ]
Lopera, S. A. [2 ]
Montagnoli, A. N. [1 ]
Mansano, R. D. [2 ]
Neto, L. G. [3 ]
机构：
[1] Univ Fed Sao Carlos, CCET, BR-13560 Sao Carlos, SP, Brazil
[2] Univ Sao Paulo, LSI PSI, Sao Paulo, Brazil
[3] Univ Sao Paulo, EESC, Sao Paulo, Brazil
来源：
MICROELECTRONICS TECHNOLOGY AND DEVICES - SBMICRO 2012 | 2012年 / 49卷 / 01期
基金：
巴西圣保罗研究基金会;
关键词：
SOL-GEL GLASS; DESIGN;
D O I：
10.1149/04901.0339ecst
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
This work presents the fabrication of a high fill factor Fresnel microlens array (MLA) by employing a low-cost home-built maskless exposure lithographic system. A phase relief structure was generated on a photoresist-coated silicon wafer, replicated in Polydimethylsiloxane (PDMS) and electrostatically bonded to a glass substrate. Optical characterization was based on the evaluation of the maximum intensity of each spot generated at the MLA focal plane as well as its full width at half maximum (FWHM) intensity values. The resulting FWHM and maximum intensity spot mean values were 50 +/- 8% mu m and 0.71 +/- 7% a.u, respectively. Such a MLA can be applied as Shack-Hartmann wavefront sensors, in optical interconnects and to enhance the efficiency of detector arrays.
引用
收藏
页码：339 / 345
页数：7
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