Dielectric constant and light emission in Si/SiO2 superlattices

被引:10
|
作者
Tran, M [1 ]
Tit, N
Dharma-wardana, MWC
机构
[1] McMaster Univ, Dept Phys & Astron, Hamilton, ON L8S 4M1, Canada
[2] United Arab Emirates Univ, Dept Phys, Al Ain, U Arab Emirates
[3] Natl Res Council Canada, Inst Microstruct Sci, Ottawa, ON K1A 0R6, Canada
关键词
D O I
10.1063/1.125561
中图分类号
O59 [应用物理学];
学科分类号
摘要
The real part of the frequency-dependent dielectric function epsilon(1)(omega) and the light-absorption coefficient alpha(omega), of Si slabs confined within SiO2 barriers have been calculated as a function of Si-slab thickness d(si). The calculation uses the imaginary part epsilon(2)(omega) of the dielectric function obtained from tight-binding calculations. The resulting static dielectric constants are found to increase with the decreasing Si-slab width, contrary to some reported theoretical results for H-terminated Si or pure-Si clusters. The calculated integrated light absorption in the range 1.0-2.6 eV is a maximum for for slabs with d(si) similar to 20 Angstrom, in agreement with experimental work on light emission from Si/SiO2 superlattices and other oxidized Si nanostructures. (C) 1999 American Institute of Physics. [S0003-6951(99)02252-4].
引用
收藏
页码:4136 / 4138
页数:3
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