Fabrication of 200 nm Period Hard X-ray Phase Gratings

被引：31

作者：

Miao, Houxun ^{[1
]}

Gomella, Andrew A. ^{[1
]}

Chedid, Nicholas ^{[1
]}

Chen, Lei ^{[2
]}

Wen, Han ^{[1
]}

机构：

[1] NHLBI, Imaging Phys Lab, Biochem & Biophys Ctr, NIH, Bethesda, MD 20892 USA

[2] NIST, Ctr Nanoscale Sci & Technol, Gaithersburg, MD 20899 USA

来源：

NANO LETTERS | 2014年 / 14卷 / 06期

基金：

美国国家卫生研究院;

关键词：

X-ray grating far-field interferometer; X-ray phase contrast imaging; nanoimprint lithography; cryogenic reactive ion etch; atomic layer deposition; electroplating; DEPOSITION; GOLD;

D O I：

10.1021/nl5009713

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Far field X-ray grating interferometry achieves extraordinary phase sensitivity in imaging weakly absorbing samples, provided that the grating period is within the transverse coherence length of the X-ray source. Here we describe a cost-efficient process to fabricate large area, 100 nm half-pitch hard X-ray phase gratings with an aspect ratio of 32. The nanometric gratings are suitable for ordinary compact X-ray sources having low spatial coherence, as demonstrated by X-ray diffraction experiments.

引用

页码：3453 / 3458

页数：6

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