Materials Characterization by Near-field Scanning Microwave Microscopy

被引：0
|
作者：
Gu, Sijia [1 ]
Lin, Tianjun [1 ]
Lasri, Tuami [1 ]
机构：
[1] Univ Lille 1, Inst Elect Microelect & Nanotechnol, Ave Poincare CS 60069, F-59652 Villeneuve Dascq, France
来源：
2016 PROGRESS IN ELECTROMAGNETICS RESEARCH SYMPOSIUM (PIERS) | 2016年
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D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Near-field scanning microwave microscope (NFSMM) has potentials to achieve characterizations of materials with high spatial resolution and sensitivity. A wide range of applications have been addressed such as dielectric constant measurement, impedance analysis of metals and semiconductor materials/devices, gas and chemical sensing, etc. [1, 2].
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页码：1474 / 1475
页数：2
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