Probe diagnostics of microwave plasma at frequency 2.45 GHz in CW and pulse regime

被引:3
|
作者
Stranak, V.
Adamek, P.
Blazek, J.
Tichy, M.
Spatenka, P.
机构
[1] Charles Univ Prague, Fac Math & Phys, Dept Elect & Vacuum Phys, CR-18000 Prague 8, Czech Republic
[2] Univ S Bohemia, Fac Educ, Dept Phys, Ceske Budejovice 37115, Czech Republic
[3] Tech Univ Liberec, Fac Mech Engn, Dept Mat Sci, Liberec 46117, Czech Republic
关键词
surfatron; microwave plasma 2.45 GHz; double Langmuir probe; electron temperature; diagnostics of pulsed discharge;
D O I
10.1002/ctpp.200610028
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
The paper is focused on diagnostics of newly developed surfatron-based plasma source working at frequency 2.45 GHz. This plasma source of jet type can be operated in cw as well as in PC controlled pulse regime. We carried out diagnostic of the plasma exiting the nozzle by single and double Langmuir probe in cw as well as in pulsed regime of plasma source operation. The basic plasma parameters - electron density and electron temperature - are estimated from single probe measurements at low pressures. The electron temperature in wide range of pressures is evaluated from double probe measurements. Time evolution of electron temperature along a single period in pulsed mode of operation is measured and discussed. The exiting plasma stream is directly applied on a plastic material sample (PE) with the aim to increase its hydrophility. Degree of hydrophility is characterized by contact angle measurements. Relations between process plasma parameters and results of contact angle measurements are discussed. (C) 2006 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
引用
收藏
页码:439 / 444
页数:6
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