Guide for determining ICP/ICP-MS method detection limits and instrument performance

被引:0
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作者
Sivakumar, Vanaja [1 ]
Ernyei, Laszlo [1 ]
Obenauf, Ralph H. [1 ]
机构
[1] SPEX CertiPrep Inc, Metuchen, NJ 08840 USA
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O433 [光谱学];
学科分类号
0703 ; 070302 ;
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页码:13 / 13
页数:1
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