Effects of proton radiation on field limiting ring edge terminations in 4H-SiC junction barrier Schottky diodes

被引:1
|
作者
Song, QingWen [1 ,2 ]
Tang, XiaoYan [1 ,2 ]
Han, Chao [1 ,2 ]
Yuan, Hao [1 ,2 ]
Yang, Shuai [1 ,2 ]
He, XiaoNing [1 ,2 ]
Zhang, YiMeng [1 ,2 ]
Zhang, YiMen [1 ,2 ]
Zhang, YuMing [1 ,2 ]
机构
[1] Xidian Univ, Sch Microelect, Xian 710071, Shaanxi, Peoples R China
[2] State Key Discipline Lab Wide Band Gap Semicond T, Xian 710071, Shaanxi, Peoples R China
基金
中国国家自然科学基金;
关键词
4H-SiC; power device; edge termination; radiation effects;
D O I
10.1007/s11431-018-9394-8
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this study, the effects of high-energy proton radiation on the effectiveness of edge terminations using field limiting rings (FLRs) in 4H-SiC junction barrier Schottky (JBS) diodes were examined in detail. The devices were irradiated using 5-MeV protons at fluences ranging from 5x10(12) cm(-2) to 5x10(14) cm(-2). Further, the reverse breakdown performances of the investigated devices were measured both before and after irradiation. Proton irradiation initially decreased the breakdown voltage (BV); subsequently, the BV was increased as the proton fluence increased. At a fluence of 5x10(13) cm(-2), the BV was reduced by approximately 18%, whereas it was reduced by approximately 5% at a higher proton fluence of 5x10(14) cm(-2). The related degradation mechanism that was associated with this phenomenon was also investigated using the numerical simulations of the current-voltage (I-V) and capacitance-voltage (C-V) characteristics of the device. The main contribution to the radiation-induced changes in BV originates from the variations of charge distribution at the SiO2/4H-SiC interface and the reduction of the net carrier density in the drift region. Both the aforementioned variations affect the spread of the electric field in the FLR edge termination regions.
引用
收藏
页码:1210 / 1216
页数:7
相关论文
共 50 条
  • [41] Characteristic and Robustness of Trench Floating Limiting Rings for 4H-SiC Junction Barrier Schottky Rectifiers
    Yuan, Hao
    Liu, Yancong
    He, Yanjing
    Hu, Yanfei
    Zhang, Tingsong
    Tang, Xiaoyan
    Song, Qingwen
    Zhang, Yimen
    Zhang, Yuming
    He, Xiaoning
    Qian, Qingyou
    Xiao, Li
    IEEE ELECTRON DEVICE LETTERS, 2020, 41 (07) : 1056 - 1059
  • [42] Planar terminations in 4H-SiC Schottky diodes with low leakage and high yields
    Singh, R
    Palmour, JW
    ISPSD '97: 1997 IEEE INTERNATIONAL SYMPOSIUM ON POWER SEMICONDUCTOR DEVICES AND ICS, 1997, : 157 - 160
  • [43] Effect of hydrogen treatment on 4H-SiC Schottky barrier diodes
    Chen, Zihe
    Liu, Ling
    Sun, Yunlong
    Li, Gang
    Yan, Shaoan
    Xiao, Yongguang
    Tang, Minghua
    Li, Zheng
    PHYSICA SCRIPTA, 2024, 99 (08)
  • [44] Barrier height tuning in Ti/4H-SiC Schottky diodes
    Bellocchi, G.
    Vivona, M.
    Bongiorno, C.
    Badala, P.
    Bassi, A.
    Rascuna, S.
    Roccaforte, F.
    SOLID-STATE ELECTRONICS, 2021, 186
  • [45] Investigation of barrier inhomogeneities in Mo/4H-SiC Schottky diodes
    Boussouar, L.
    Ouennoughi, Z.
    Rouag, N.
    Sellai, A.
    Weiss, R.
    Ryssel, H.
    MICROELECTRONIC ENGINEERING, 2011, 88 (06) : 969 - 975
  • [46] 4H-SiC Junction Barrier Schottky Diodes and Power MOSFETs with High Repetitive UIS Ruggedness
    Gendron-Hansen, Amaury
    Sdrulla, Dumitru
    Kashyap, Avinash
    Odekirk, Bruce
    Brower, William
    Thornhill, Laird
    2018 IEEE ENERGY CONVERSION CONGRESS AND EXPOSITION (ECCE), 2018, : 850 - 856
  • [47] Fabrication of 3.1kV/10A 4H-SiC Junction Barrier Schottky Diodes
    Wang, Chengsen
    Yuan, Hao
    Song, Qingwen
    Tang, Xiaoyan
    Jia, Renxu
    Zhang, Yuming
    Zhang, Yimen
    Shen, Yidong
    PROCEEDINGS OF 2015 IEEE 11TH INTERNATIONAL CONFERENCE ON ASIC (ASICON), 2015,
  • [48] Fabrication and characteristics of a 4H-SiC junction barrier Schottky diode
    Chen Fengping
    Zhang Yuming
    Lue Hongliang
    Zhang Yimen
    Guo Hui
    Guo Xin
    JOURNAL OF SEMICONDUCTORS, 2011, 32 (06)
  • [49] Fabrication and characteristics of a 4H-SiC junction barrier Schottky diode
    陈丰平
    张玉明
    吕红亮
    张义门
    郭辉
    郭鑫
    半导体学报, 2011, 32 (06) : 33 - 35
  • [50] Al/Ti/4H-SiC Schottky barrier diodes with inhomogeneous barrier heights
    王悦湖
    张义门
    张玉明
    宋庆文
    贾仁需
    Chinese Physics B, 2011, (08) : 388 - 392