Tuning the Electrical Properties of Si Nanowire Field-Effect Transistors by Molecular Engineering
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作者:
Bashouti, Muhammad Y.
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Technion Israel Inst Technol, Dept Chem Engn, IL-32000 Haifa, Israel
Technion Israel Inst Technol, Russell Berrie Nanotechnol Inst, IL-32000 Haifa, IsraelCUNY, Dept Phys, Brooklyn Coll, Brooklyn, NY 11210 USA
Bashouti, Muhammad Y.
[2
,3
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Tung, Raymond T.
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CUNY, Dept Phys, Brooklyn Coll, Brooklyn, NY 11210 USACUNY, Dept Phys, Brooklyn Coll, Brooklyn, NY 11210 USA
Tung, Raymond T.
[1
]
Haick, Hossam
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Technion Israel Inst Technol, Dept Chem Engn, IL-32000 Haifa, Israel
Technion Israel Inst Technol, Russell Berrie Nanotechnol Inst, IL-32000 Haifa, IsraelCUNY, Dept Phys, Brooklyn Coll, Brooklyn, NY 11210 USA
Haick, Hossam
[2
,3
]
机构:
[1] CUNY, Dept Phys, Brooklyn Coll, Brooklyn, NY 11210 USA
[2] Technion Israel Inst Technol, Dept Chem Engn, IL-32000 Haifa, Israel
[3] Technion Israel Inst Technol, Russell Berrie Nanotechnol Inst, IL-32000 Haifa, Israel
Exposed facets of n-type silicon nanowires (Si NWs) fabricated by a top-down approach are successfully terminated with different organic funcitonalities, including 1,3-dioxan,2,ethyl, butyl, allyl, and propyl-alcohol, using a two-step chlorination/alkylation method. X-ray photoemission spectroscopy and spectroscopic ellipsometry establish the bonding and the coverage of these molecular layers. Field-effect transistors fabricated from these Si NWs displayed characteristics that depended critically on the type of molecular termination. Without molecules the source-drain conduction is unable to be turned off by negative gate voltages as large as -20 V. Upon adsorption of organic molecules there is an observed increase in the "on" current at large positive gate voltages and also a reduction, by several orders of magnitude, of the "off" current at large negative gate voltages. The zero-gate voltage transconductance of molecule-terminated Si NW correlates with the type of organic molecule. Adsorption of butyl and 1,3-dioxan-2-ethyl molecules improves the channel conductance over that of the original SiO2-Si NW, while adsorption of molecules with propyl-alcohol leads to a reduction. It is shown that a simple assumption based on the possible creation of surface states alongside that attachment of molecules may lead to a qualitative explanation of these electrical characteristics. The possibility and potential implications of modifying semiconductor devices by tuning the distribution of surface states via the funtionality of attached molecules are discussed.
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Tokyo Inst Technol, Frontier Res Ctr, Midori Ku, Yokohama, Kanagawa 2268502, JapanTokyo Inst Technol, Frontier Res Ctr, Midori Ku, Yokohama, Kanagawa 2268502, Japan
Sato, Soshi
Kamimura, Hideyuki
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Tokyo Inst Technol, Frontier Res Ctr, Midori Ku, Yokohama, Kanagawa 2268502, JapanTokyo Inst Technol, Frontier Res Ctr, Midori Ku, Yokohama, Kanagawa 2268502, Japan
Kamimura, Hideyuki
Arai, Hideaki
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Tokyo Inst Technol, Frontier Res Ctr, Midori Ku, Yokohama, Kanagawa 2268502, JapanTokyo Inst Technol, Frontier Res Ctr, Midori Ku, Yokohama, Kanagawa 2268502, Japan
Arai, Hideaki
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Kakushima, Kuniyuki
Ahmet, Parhat
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Tokyo Inst Technol, Interdisciplinary Grad Sch Sci & Engn, Midori Ku, Yokohama, Kanagawa 2268502, JapanTokyo Inst Technol, Frontier Res Ctr, Midori Ku, Yokohama, Kanagawa 2268502, Japan
Ahmet, Parhat
Ohmori, Kenji
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Waseda Univ, Nanotechnol Res Lab, Shinjuku Ku, Tokyo 1620041, JapanTokyo Inst Technol, Frontier Res Ctr, Midori Ku, Yokohama, Kanagawa 2268502, Japan
Ohmori, Kenji
Yamada, Keisaku
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Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, JapanTokyo Inst Technol, Frontier Res Ctr, Midori Ku, Yokohama, Kanagawa 2268502, Japan
Yamada, Keisaku
Iwai, Hiroshi
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Tokyo Inst Technol, Frontier Res Ctr, Midori Ku, Yokohama, Kanagawa 2268502, JapanTokyo Inst Technol, Frontier Res Ctr, Midori Ku, Yokohama, Kanagawa 2268502, Japan
机构:
Pohang Univ Sci & Technol POSTECH, Dept Mat Sci & Engn, Pohang 37673, Gyeongbuk, South Korea
Stanford Univ, Dept Chem Engn, Stanford, CA 94305 USAPohang Univ Sci & Technol POSTECH, Dept Mat Sci & Engn, Pohang 37673, Gyeongbuk, South Korea
Lee, Yeongjun
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Oh, Jin Young
Kim, Taeho Roy
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Stanford Univ, Dept Mat Sci & Engn, Stanford, CA 94305 USAPohang Univ Sci & Technol POSTECH, Dept Mat Sci & Engn, Pohang 37673, Gyeongbuk, South Korea
Kim, Taeho Roy
Gu, Xiaodan
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Stanford Univ, Dept Chem Engn, Stanford, CA 94305 USA
SLAC Natl Accelerator Lab, Stanford Synchrotron Radiat Lightsource, Menlo Pk, CA 94025 USA
Univ Southern Mississippi, Sch Polymers & High Performance Mat, Hattiesburg, MS 39406 USAPohang Univ Sci & Technol POSTECH, Dept Mat Sci & Engn, Pohang 37673, Gyeongbuk, South Korea
Gu, Xiaodan
Kim, Yeongin
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Stanford Univ, Dept Elect Engn, Stanford, CA 94305 USAPohang Univ Sci & Technol POSTECH, Dept Mat Sci & Engn, Pohang 37673, Gyeongbuk, South Korea
Kim, Yeongin
Wang, Ging-Ji Nathan
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Stanford Univ, Dept Chem Engn, Stanford, CA 94305 USAPohang Univ Sci & Technol POSTECH, Dept Mat Sci & Engn, Pohang 37673, Gyeongbuk, South Korea
Wang, Ging-Ji Nathan
Wu, Hung-Chin
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Stanford Univ, Dept Chem Engn, Stanford, CA 94305 USAPohang Univ Sci & Technol POSTECH, Dept Mat Sci & Engn, Pohang 37673, Gyeongbuk, South Korea
Wu, Hung-Chin
Pfattner, Raphael
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Stanford Univ, Dept Chem Engn, Stanford, CA 94305 USAPohang Univ Sci & Technol POSTECH, Dept Mat Sci & Engn, Pohang 37673, Gyeongbuk, South Korea
Pfattner, Raphael
To, John W. F.
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Stanford Univ, Dept Chem Engn, Stanford, CA 94305 USAPohang Univ Sci & Technol POSTECH, Dept Mat Sci & Engn, Pohang 37673, Gyeongbuk, South Korea
To, John W. F.
Katsumata, Toru
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Stanford Univ, Dept Chem Engn, Stanford, CA 94305 USAPohang Univ Sci & Technol POSTECH, Dept Mat Sci & Engn, Pohang 37673, Gyeongbuk, South Korea
Katsumata, Toru
Son, Donghee
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Stanford Univ, Dept Chem Engn, Stanford, CA 94305 USAPohang Univ Sci & Technol POSTECH, Dept Mat Sci & Engn, Pohang 37673, Gyeongbuk, South Korea
Son, Donghee
Kang, Jiheong
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Stanford Univ, Dept Chem Engn, Stanford, CA 94305 USAPohang Univ Sci & Technol POSTECH, Dept Mat Sci & Engn, Pohang 37673, Gyeongbuk, South Korea
Kang, Jiheong
Matthews, James R.
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Corning Inc, Corning, NY 14831 USAPohang Univ Sci & Technol POSTECH, Dept Mat Sci & Engn, Pohang 37673, Gyeongbuk, South Korea
Matthews, James R.
Niu, Weijun
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Corning Inc, Corning, NY 14831 USAPohang Univ Sci & Technol POSTECH, Dept Mat Sci & Engn, Pohang 37673, Gyeongbuk, South Korea
Niu, Weijun
He, Mingqian
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Corning Inc, Corning, NY 14831 USAPohang Univ Sci & Technol POSTECH, Dept Mat Sci & Engn, Pohang 37673, Gyeongbuk, South Korea
He, Mingqian
Sinclair, Robert
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Stanford Univ, Dept Mat Sci & Engn, Stanford, CA 94305 USAPohang Univ Sci & Technol POSTECH, Dept Mat Sci & Engn, Pohang 37673, Gyeongbuk, South Korea
Sinclair, Robert
Cui, Yi
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Stanford Univ, Dept Mat Sci & Engn, Stanford, CA 94305 USAPohang Univ Sci & Technol POSTECH, Dept Mat Sci & Engn, Pohang 37673, Gyeongbuk, South Korea
Cui, Yi
Tok, Jeffery B. -H.
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Stanford Univ, Dept Chem Engn, Stanford, CA 94305 USAPohang Univ Sci & Technol POSTECH, Dept Mat Sci & Engn, Pohang 37673, Gyeongbuk, South Korea
Tok, Jeffery B. -H.
Lee, Tae-Woo
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Seoul Natl Univ, PLUS SNU Mat Div Educ Creat Global Leaders BK21, Res Inst Adv Mat, Dept Mat Sci & Engn, Seoul 08826, South KoreaPohang Univ Sci & Technol POSTECH, Dept Mat Sci & Engn, Pohang 37673, Gyeongbuk, South Korea
Lee, Tae-Woo
Bao, Zhenan
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Stanford Univ, Dept Chem Engn, Stanford, CA 94305 USAPohang Univ Sci & Technol POSTECH, Dept Mat Sci & Engn, Pohang 37673, Gyeongbuk, South Korea