Ultrafast trapping times in ion implanted InP

As+ and P+ implantation was performed on semi-insulating (SI) and p-type InP samples for the purpose of creating a material suitable for ultrafast optoelectronic applications. SI InP samples were implanted with a dose of 1x10(16) cm(-2) and p-type InP was implanted with doses between 1x10(12) and 1x10(16) cm(-2). Subsequently, rapid thermal annealing at temperatures between 400 and 700 degreesC was performed for 30 sec. Hall-effect measurements, double-crystal x-ray diffraction, and time-resolved femtosecond differential reflectivity showed that, for the highest-annealing temperatures, the implanted SI InP samples exhibited high mobility, low resistivity, short response times, and minimal structural damage. Similar measurements on implanted p-type InP showed that the fast response time, high mobility, and good structural recovery could be retained while increasing the resistivity. (C) 2002 American Institute of Physics.