A new semi-analytical method analyzing the magnetic field in unbalanced magnetron sputtering system

被引：2

作者：

Han, Liang ^{[1
,2
]}

Zhao, YuQing ^{[1
]}

Wang, YanWu ^{[1
]}

机构：

[1] Xi An Jiao Tong Univ, Minist Educ, Key Lab Phys Elect & Devices, Xian 710049, Peoples R China

[2] Xidian Univ, Sch Tech Phys, Xian 710071, Peoples R China

来源：

VACUUM | 2009年 / 83卷 / 11期

关键词：

Semi-analytical method; Unbalanced magnetron sputtering; Magnetic field; SIMULATION; COATINGS;

D O I：

10.1016/j.vacuum.2009.04.040

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A new method, semi-analytical method (SAM), is first applied to calculate and analyze the magnetic filed in unbalanced magnetron sputtering system, and introduced in detail. An analytic solution of the scalar magnetic potential in the system can be acquired by the SAM. Its unknown number is much less than that in the numerical method. The analytic series expression of magnetic flux density can be easily obtained directly by differentiating the scalar magnetic potential function, and it can also easily ensure the precision of solving the magnetic flux density. The comparison of results between the values measured by experiment and the values calculated by the SAM has shown correctness and effectiveness of this method. The SAM cannot only accurately describe the distribution of magnetic flux density and optimize magnetic field in unbalanced magnetron sputtering system, but also be conveniently used for the simulation about plasma distribution and thin film growth. (C) 2009 Elsevier Ltd. All rights reserved.

引用

页码：1317 / 1320

页数：4

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