Influence of dislocation density and carbon impurities in i-GaN layer on the performance of Schottky barrier ultraviolet photodetectors

被引:8
|
作者
Yi Linkai [1 ]
Qi Haoran [1 ]
Huang Jialin [1 ]
Zhou Mei [1 ]
Zhao Degang [2 ]
Jiang Desheng [2 ]
Yang Jing [2 ]
Liu Wei [2 ]
Liang Feng [2 ]
机构
[1] China Agr Univ, Dept Phys, Beijing 100083, Peoples R China
[2] Chinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, POB 912, Beijing 100083, Peoples R China
来源
MATERIALS RESEARCH EXPRESS | 2018年 / 5卷 / 04期
关键词
GaN photodetector; dislocation density; carbon impurity; responsivity; SCATTERING;
D O I
10.1088/2053-1591/aabdd1
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The influences of dislocation density and carbon impurities in i-GaN layer on the performance of Schottky barrier ultraviolet photodetectors are investigated. It is found that an increase in dislocation density leads to a decrease in the responsivity, mainly because that the dislocation defects act as charge traps in GaN which can increase the recombination probability of photo-generated electron-hole pairs. On the other hand, it is shown that high carbon impurity content in the i-GaN layer also causes a decrease of the responsivity, mainly because the fact that the photo-generated carriers can't be effectively collected due to the effect of C-induced deep level centers related to carbon impurities. To fabricate high performance GaN based ultraviolet photodetectors, it is important to reduce dislocation density and keep a relatively low concentration of residual carbon during the material growth.
引用
收藏
页数:6
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