Visualization of the development process in deep X-ray lithography

被引：1
|
作者：
Nazmov, V. [1 ,2 ]
Mohr, J. [1 ]
Reznikova, E. [1 ,2 ]
机构：
[1] Forschungszentrum Karlsruhe, Inst Microstruct Technol, D-76021 Karlsruhe, Germany
[2] Univ Karlsruhe, Inst Microstruct Technol, D-76131 Karlsruhe, Germany
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT | 2009年 / 603卷 / 1-2期
关键词：
X-ray exposure; Synchrotron radiation; High aspect ratio; LIGA microstructures; PMMA;
D O I：
10.1016/j.nima.2008.12.148
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
In this work the contour visualization method of developed high aspect ratio microstructures with any lateral size of similar to 1 mu m in thick PMMA layers using normal and tilted SIR exposure is proposed in order to investigate the microstructures behaviour and the development process. This method can be also applied in situ during the development process. (C) 2009 Published by Elsevier B.V.
引用
收藏
页码：153 / 156
页数：4
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