Fabrication of three-dimensional microfluidic systems by stacking molded polydimethylsiloxane(PDMS) layers

被引:26
|
作者
Jo, BH [1 ]
Beebe, DJ [1 ]
机构
[1] Univ Illinois, Beckman Inst Adv Sci & Technol, Dept Elect & Comp Engn, Urbana, IL 61801 USA
来源
关键词
SU-8; reactive ion etching (RIE); three-dimensional (3D) micro-channel; polydimethylsiloxane (PDMS); micro molding; hydrophobic; hydrophilic;
D O I
10.1117/12.359340
中图分类号
TH [机械、仪表工业];
学科分类号
0802 ;
摘要
A new technique to fabricate three-dimensional (3D) microchannels using polydimethylsiloxane (PDMS) elastomer material is presented. The process allows for the stacking of many thin (about 100 mu m thick) patterned PDMS layers to realize complex 3D channel paths. Replica molding method is utilized to generate each layer. The master for each layer is formed on a silicon wafer using SU-8 positive relief photoresist. PDMS is cast against the master producing molded layers containing channels and openings. To realize thin layers with openings, a sandwich molding configuration was developed that allows precise control of the PDMS thickness. The master wafer is clamped within a sandwich that includes flat aluminum plates, a flexible polyester film layer, a rigid Pyrex wafer and a rubber sheet. A parametric study is performed on PDMS surface activation in a reactive ion etching (RTE) system and the subsequent methanol treatment for bonding and aligning very thin individual components to a substrate. Low RF power and short treatment times are better than high RF power and long treatment times respectively for instant bonding. Layer to layer alignment of less then 15 mu m is achieved with manual alignment techniques that utilize surface tension driven self alignment methods. A coring procedure is used to realize off chip fluidic connections via the bottom PDMS layer, allowing the top layer to remain smooth and flat for complete optical access. After fabricating 3D channel paths, the hydrophobic surfaces of the inside channel walls can be activated (hydrophobic to hydrophilic) an oxygen plasma RIE system.
引用
收藏
页码:222 / 229
页数:8
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