The site-specific reactivity of isopropanol in aqueous silicon etching: Controlling morphology with surface chemistry

被引：32
|
作者：
Newton, TA [1 ]
Huang, YC
Lepak, LA
Hines, MA
机构：
[1] Cornell Univ, Dept Chem, Ithaca, NY 14853 USA
[2] Cornell Univ, Dept Appl & Engn Phys, Ithaca, NY 14853 USA
来源：
JOURNAL OF CHEMICAL PHYSICS | 1999年 / 111卷 / 20期
关键词：
D O I：
10.1063/1.479386
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
The site-specific rates of isopropanol reaction on Si(111) were studied by kinetic competition with an etchant of known anisotropy and quantified using concentration-dependent changes in the etched surface morphology using a combination of STM measurements and kinetic Monte Carlo simulations. The isopropoxide ion was identified as the active species. (C) 1999 American Institute of Physics. [S0021-9606(99)70344-2].
引用
收藏
页码：9125 / 9128
页数：4
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