Quantum transport simulation of graphene-nanoribbon field-effect transistors with defects

被引:7
|
作者
Chen, Shanmeng [1 ]
Van de Put, Maarten L. [1 ]
Fischetti, Massimo, V [1 ]
机构
[1] Univ Texas Dallas, Dept Mat Sci & Engn, 800 W Campbell Rd,RL 10, Richardson, TX 75080 USA
基金
美国国家科学基金会;
关键词
Quantum transport; Graphene nanoribbon; Defects;
D O I
10.1007/s10825-020-01588-1
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We present a theoretical study of the effect of defects on the charge-transport properties of gate-all-around graphene nanoribbons field-effect transistors. Electronic transport is treated atomistically using an efficient method we have recently proposed that makes use of a Bloch-wave basis obtained from empirical pseudopotentials and solves the Schrodinger equation with open boundary conditions using the quantum transmitting boundary method. The defects considered here consist in single vacancies at different locations in the ribbon (center and edge of the ribbon; in the source or drain regions or along the channel). We have found that vacancies located at different locations along the ribbon width alter differently the Kekule patterns: Defects at the edge reduce the I-on/I-off more than defects located near the center of the ribbon, and the effect is stronger in narrow ribbons. These results show that any proposed technology based on graphene nanoribbons must be able to control the quality of the material down to a single atom.
引用
收藏
页码:21 / 37
页数:17
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