Patents and R&D with imitation and licensing

被引：20
|
作者：
Mukherjee, Arijit [1 ]
机构：
[1] Univ Nottingham, Sch Econ, Leverhulme Ctr Res Globalisat & Econ Policy, Nottingham NG7 2RD, England
来源：
ECONOMICS LETTERS | 2006年 / 93卷 / 02期
关键词：
inventing around; knowledge spillover; patent protection; R&D; technology licensing;
D O I：
10.1016/j.econlet.2006.05.002
中图分类号：
F [经济];
学科分类号：
02 ;
摘要：
We show the effect of patent protection on R&D investment in the presence of 'inventing around' (or 'non-infringing' imitation) and technology licensing. Though the 'tournament effect' under patent protection may reduce R&D investment, we show that the effect of either imitation or technology licensing may always dominate the tournament effect and create higher R&D investment under patent protection. The effect of higher R&D investment on welfare is ambiguous. (c) 2006 Elsevier B.V. All rights reserved.
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页码：196 / 201
页数：6
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