DC/AC Electrical Instability of RF Sputter Amorphous In-Ga-Zn-O TFTs

被引:0
|
作者
Fung, Tze-Ching [1 ]
Abe, Katsumi [2 ]
Kumomi, Hideya [2 ]
Kanicki, Jerzy [1 ]
机构
[1] Univ Michigan, Dept Elect Engn & Comp Sci, Ann Arbor, MI 48105 USA
[2] Canon Inc, Canon Res Ctr, Ohta Ku, Tokyo 1468501, Japan
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中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The paper presents the study of electrical instability of RF sputter amorphous In-Ga-Zn-O (a-IGZO) thin-film transistor (TFT) induced by negative steady-state (or D.C.) bias-temperature-stress (BTS). Similarly to positive BTS results [8], the stress time evolution of the threshold voltage shift (Delta V-th) induced by negative BTS under different stress voltages and temperatures can all be described by the stretched-exponential model. For the first time, we also present the results for Delta V-th under pulse (or A.C.) BTS. The Delta V-th for positive A. C. BTS is found to have a pulse period dependence while a huge reduction of AV,h is found for all negative A.C. BTS results. This might suggest the lime for holes to accumulate near the a-IGZO/SiO2 interface is much longer than the time for electrons. The effect of bi-polar stressing is also discussed.
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页码:1117 / +
页数:2
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