The changes in the chemical composition, atomic structure, and electronic properties of the p-GaN(0001) surface upon chemical treatment in an HCl-isopropanol solution and vacuum annealing are investigated by x-ray photoelectron spectroscopy, high-resolution electron energy-loss spectroscopy, and low-energy electron diffraction. It is demonstrated that a considerable part of the surface gallium oxide is removed upon chemical treatment of the GaN surface. Subsequent annealing of the surface under vacuum at temperatures of 400-450degreesC leads to a decrease in the residual carbon and oxygen contamination to 3-5% of the monolayer. The preparation of a clean p-GaN(0001) surface with a (1 x 1) structure identical to that of the bulk unit cells is confirmed by the low-energy electron diffraction data. The cesium adsorption on the clean p-GaN surface results in a decrease in the work function by similar to2.5 eV and the appearance of an effective negative electron affinity on the surface. The quantum efficiency of the GaN photocathode at a wavelength of 250 nm is equal to 26%. (C) 2004 MAIK "Nauka / Interperiodica".
机构:
Nagoya Univ, Dept Elect Engn & Comp Sci, Venture Business Lab,Akasaki Res Ctr, Chikusa Ku, Nagoya, Aichi 4648603, JapanNagoya Univ, Dept Elect Engn & Comp Sci, Venture Business Lab,Akasaki Res Ctr, Chikusa Ku, Nagoya, Aichi 4648603, Japan