Free-surface thin-film flows over uniformly heated topography

被引:59
|
作者
Saprykin, Sergey [1 ]
Trevelyan, Philip M. J.
Koopmans, Rudy J.
Kalliadasis, Serafim
机构
[1] Univ London Imperial Coll Sci Technol & Med, Dept Chem Engn, London SW7 2AZ, England
[2] Dow Benelux BV, Core R&D, NL-4530 AA Terneuzen, Netherlands
关键词
D O I
10.1103/PhysRevE.75.026306
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
The long-wave (lubrication) approximation governing the evolution of a thin film over a uniformly heated topographical substrate is solved numerically. We study the initial-value problem for a variety of governing dimensionless parameters and topographical substrates. We demonstrate that the dynamics is characterized by a slow relaxation process with continuous coarsening of drops up to a large time where coarsening is terminated and the interface organizes into a series of drops each of which is located in a trough in topography.
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页数:17
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