Growth and characterization of Ag-Cu 2 O thin films: DC magnetron sputtering method

被引：1
|
作者：
Prasad, M. Nagendra Vara [1 ]
Reddy, Y. Munikrishna [1 ]
机构：
[1] SSBN Degree & PG Coll, Dept Phys, Ananthapuramu 515001, AP, India
来源：
MATERIALS TODAY-PROCEEDINGS | 2020年 / 27卷
关键词：
OXIDE; PHOTOCATHODE;
D O I：
10.1016/j.matpr.2019.11.285
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：486 / 491
页数：6
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