Site-specific formation of nanoporous silicon on micro-fabricated silicon surfaces

被引：0

作者：

Ou, FS ^{[1
]}

Saraf, LV ^{[1
]}

Baer, DR ^{[1
]}

机构：

[1] Pacific NW Natl Lab, Environm Mol Sci Lab, Richland, WA 99352 USA

来源：

PROGRESS IN COMPOUND SEMICONDUCTOR MATERIALS IV-ELECTRONIC AND OPTOELECTRONIC APPLICATIONS | 2005年 / 829卷

关键词：

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We demonstrated an ability to control the location of the porous silicon formation during electro-chemical etching by the introduction of micro-fabricated defects. This ability may open new doors for chemical and biological applications of porous silicon. In this paper, we have focused on the experimental procedure used to form this site-specific porous silicon area on micro-fabricated silicon surface. We also compared our results with work carried out by Saraf et al[1] during the early stage of porous silicon formation in conventional electrochemical etching.

引用

页码：455 / 459

页数：5

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