Ultra-Thin Chip Technology for System-in-Foil Applications

被引:0
|
作者
Angelopoulos, Evangelos A. [1 ]
Zimmermann, Martin [1 ]
Appel, Wolfgang [1 ]
Endler, Stefan [1 ]
Ferwana, Saleh [1 ]
Harendt, Christine [1 ]
Hoang, Tu [1 ]
Pruemm, Andreas [1 ]
Burghartz, Joachim N. [1 ]
机构
[1] Inst Microelect Stuttgart IMS CHIPS, D-70569 Stuttgart, Germany
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中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A new additive ultra-thin chip fabrication process is presented, utilizing an array of vertical anchors that mechanically connect silicon membrane chips to a standard silicon wafer. The process is demonstrated down to 8 mu m silicon chip thickness, with a chip thickness control better than +/-0.2 mu m and a surface topography with average roughness < 7 nm. Such pre-processed wafers can be used for CMOS manufacturing like any conventional silicon substrate. A wide process window with yield figures exceeding 99% is achieved by proper management of the built-in and externally applied stress on the anchors. The excellent mechanical flexibility and stability of these ultra-thin chips make them particularly suitable for system-in-foil applications.
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页数:4
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