The finite-element model and analysis of static contact resistance and thermal process for contact with film

被引：3
|
作者：
Li, K [1 ]
Su, XP [1 ]
Li, ZG [1 ]
Lu, JG [1 ]
Zhang, GS [1 ]
机构：
[1] Hebei Univ Technol, Tianjin 300130, Peoples R China
来源：
ELECTRICAL CONTACTS - 1998 | 1998年
关键词：
contact resistance; thermal process; film; finite-element method;
D O I：
10.1109/HOLM.1998.722450
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Contact resistance and thermal process are very important parameters for contact. The film on contact surface has influence on contact resistance and the thermal process. This paper has analyzed the static contact resistance and the thermal process, and then the finite-element models are proposed for contact with film. The contact boundary condition is automatically meet in calculating with the finite-element method for contact without film, but it will be changed when the contacts are covered with film. We have developed the finite-element program for contact with film. Our results for resistance of single-spot contact are approximate to the theory value. Finally we have analyzed the effect of the film on thermal process.
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页码：226 / 229
页数：4
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