Cold remote nitrogen plasma effects on pulsed laser deposited CNx films characteristics

被引：0
|
作者：
Jama, C [1 ]
Goudmand, P [1 ]
机构：
[1] Univ Sci & Tech Lille Flandres Artois, EA MENESR1761, Lab Physicochim Energet & Plasmas, F-59655 Villeneuve Dascq, France
来源：
FULLERENES AND CARBON BASED MATERIALS | 1998年 / 68卷
关键词：
carbon nitride; laser ablation; plasma deposition; surface properties; XPS;
D O I：
暂无
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Carbon nitride films were deposited by ablation of carbon molecular fragments from a graphite targets on a silicon substrate after few pulses of a localized transversely excited atmospheric pressure CO2 laser. Deposition media were either a non excited nitrogen flow or cold remote plasma of nitrogen. Fourier transform infrared spectra of the deposited films show a very efficient nitrogen fixation with C-N bands characteristic of tetrahedral carbon. The effect of the distance of deposition zone from the discharge is also discussed. (C) 1998 Elsevier Science Ltd. All rights reserved.
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页码：785 / 789
页数：5
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