Chemical vapor deposition of single-walled carbon nanotubes using ultrathin Ni/Al film as catalyst

被引：99
|
作者：
Zhang, RY
Amlani, L
Baker, J
Tresek, J
Tsui, RK
机构：
[1] Motorola Labs, Phys Sci Res Labs, Tempe, AZ 85284 USA
[2] Motorola Inc, Digital DNA Lab, Semicond Prod Sector, Tempe, AZ 85284 USA
来源：
NANO LETTERS | 2003年 / 3卷 / 06期
关键词：
D O I：
10.1021/nl034154z
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
Chemical vapor deposition (CVD) of single-walled carbon nanotubes (SWNTs) catalyzed using a few nm thick Ni layer supported by a thin Al underlayer is reported. Analysis by transmission electron microscopy shows the SWNTs having a diameter distribution between 1.5 and 2.8 nm. The effect of the Ni/Al bilayer film thickness on the density of the SWNTs is presented. Additionally, circuits of SWNTs bridging opposing Au electrodes coated with Ni/Al catalyst films are fabricated using selective CVD. The current-voltage characteristics and circuit resistance of the nanotube circuits are also discussed.
引用
收藏
页码：731 / 735
页数：5
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