Development of a laser ion source for production of high-intensity heavy-ion beams

被引:6
|
作者
Kashiwagi, H. [1 ]
Yamada, K. [1 ]
Kurashima, S. [1 ]
机构
[1] Takasaki Adv Radiat Res Inst, Natl Inst Quantum & Radiol Sci & Technol, 1233 Watanuki Machi, Takasaki, Gunma, Japan
关键词
Laser ion source; Cyclotron; Ion implanter;
D O I
10.1016/j.nimb.2016.12.033
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
A laser ion source has been developed as a high-intensity source for the ion implanter and the single pulsed beam of the azimuthally varying field cyclotron at TIARA. Highly charged beams of C5+ and C6+ ions and low-charged beams of heavy ions such as C, Al, Ti, Cu, Au, and Pt are required for the single pulse acceleration in the cyclotron and for the ion implanter, respectively. In the vacuum chamber of the ion source, a target holder on a three-dimensional linear-motion stage provides a fresh surface for each laser shot. A large-sized target with a maximum size of 300 mm x 135 mm is mounted on the holder for long-term operation. The ion current (ion charge flux) in the laser-produced plasma is measured by a Faraday cup and time-of-flight spectra of each charge state are measured using a 90 degrees cylindrical electrostatic analyzer just behind the Faraday cup. Carbon-plasma-generation experiments indicate that the source produces intense high- and low-charged pulsed ion beams. At a laser energy of 483 mJ (2.3 x 10(13) W/cm(2)), average C6+ current of 13 mA and average C+ current of 23 mA were obtained over the required time duration for single-pulse acceleration in the cyclotron (49 ns for C6+ and 80 ns for C5+). Furthermore, at 45 mJ (2.1 x 10(12) W/cm(2)), an average C2+ current of 1.6 mA over 0.88 mu s is obtained. (C) 2016 Elsevier B.V. All rights reserved.
引用
收藏
页码:256 / 259
页数:4
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