Photoinduced dislocation lines on the (111) face of C60 single crystals

被引:10
|
作者
Jiang, L
Iyoda, T
Tryk, DA
Li, J
Kitazawa, K
Fujishima, A
Hashimoto, K
机构
[1] Kanagawa Acad Sci & Technol, KAST Lab, Atsugi, Kanagawa, Japan
[2] Univ Tokyo, Fac Engn, Dept Appl Chem, Bunkyo Ku, Tokyo 113, Japan
[3] Univ Tokyo, Adv Sci & Technol Res Ctr, Meguro Ku, Tokyo 153, Japan
来源
JOURNAL OF PHYSICAL CHEMISTRY B | 1998年 / 102卷 / 33期
关键词
D O I
10.1021/jp980588k
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We report an atomic force microscopic (AFM) study of photoinduced dislocation lines (DLs) on the (111) face of C-60 Single crystals via excitation of the Frenkel exciton transition of solid C-60. Under illumination, DLs appeared along the [11(2) over bar] direction on the (111) face of the C-60 single crystals. These DLs consist of pairs of substructures that are separated by a hollow region with a width of 30.0 +/- 0.5 nm and a depth of 0.08 +/- 0.02 nm, while the height difference between the topmost regions of the substructures and the surrounding face-centered-cubic (fcc) regions is 0.30 +/- 0.03 nm. The two substructures correspond to ridgelike domain walls enclosing narrow strips of metastable hexagonal-close-packed (hcp) domains on the surrounding fee surface. It was also observed that the pair of substructures constituting the DLs is terminated by a U-shaped growing tip. The photodriven growth of these DLs displayed unique dynamic surface reconstruction behavior. They also exhibited different types of collision processes depending on the growth rate. The driving force for the dynamic process is considered to be the recombination of excitons at surface defects or at the growing tip of each DL. Furthermore, a threshold light intensity value of 0.8 mW/mm(2) was found for the generation of DLs, which indicates that multiexciton relaxation is a prerequisite for the photoinduced dislocation.
引用
收藏
页码:6351 / 6359
页数:9
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