Low-Voltage, Flexible InGaZnO Thin-Film Transistors Gated With Solution-Processed, Ultra-Thin AlxOy

被引:23
|
作者
Cai, Wensi [1 ]
Wilson, Joshua [1 ]
Zhang, Jiawei [1 ]
Park, Seonghyun [1 ]
Majewski, Leszek [1 ]
Song, Aimin [1 ,2 ]
机构
[1] Univ Manchester, Sch Elect & Elect Engn, Manchester M13 9PL, Lancs, England
[2] Shandong Univ, Ctr Nanoelect, Sch Microelect, State Key Lab Crystal Mat, Jinan 250100, Shandong, Peoples R China
基金
中国国家自然科学基金; 英国工程与自然科学研究理事会;
关键词
Indium-gallium-zinc-oxide; thin-film transistors (TFTs); plastic substrate; 1 V operation; OXIDE; PERFORMANCE; DIELECTRICS; FABRICATION; ALUMINUM;
D O I
10.1109/LED.2018.2882464
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Indium-gallium-zinc-oxide thin-film transistors gated with solution-processed, ultra-thin AlxOy have been fabricated on a plastic substrate. The effects of bending on the gate dielectric in terms of leakage current density and capacitance density have been studied. The devices show a low operating voltage of less than 1 V, a high current on/off ratio >10(5), and a low subthreshold swing <90 mV/decade. The devices maintain their high performance even when flexed to a curvature radius of 11 mm. As a result, such devices possess a great potential for low-power, flexible electronics.
引用
收藏
页码:36 / 39
页数:4
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