Nanometer patterning with ice

被引：50

作者：

King, GM ^{[1
]}

Schurmann, G

Branton, D

Golovchenko, JA

机构：

[1] Harvard Univ, Dept Phys, Cambridge, MA 02138 USA

[2] Harvard Univ, Dept Mol & Cellular Biol, Cambridge, MA 02138 USA

[3] Harvard Univ, Div Engn & Appl Sci, Cambridge, MA 02138 USA

来源：

NANO LETTERS | 2005年 / 5卷 / 06期

关键词：

D O I：

10.1021/nl050405n

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Nanostructures can be patterned with focused electron or ion beams in thin, stable, conformal films of water ice grown on silicon. We use these patterns to reliably fabricate sub-20 nm wide metal lines and exceptionally well-defined, sub-10 nanometer beam-induced chemical surface transformations. We argue more generally that solid-phase condensed gases of low sublimation energy are ideal materials for nanoscale patterning, and water, quite remarkably, may be among the most useful.

引用

页码：1157 / 1160

页数：4

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