Nanometer patterning with ice

被引:50
|
作者
King, GM [1 ]
Schurmann, G
Branton, D
Golovchenko, JA
机构
[1] Harvard Univ, Dept Phys, Cambridge, MA 02138 USA
[2] Harvard Univ, Dept Mol & Cellular Biol, Cambridge, MA 02138 USA
[3] Harvard Univ, Div Engn & Appl Sci, Cambridge, MA 02138 USA
关键词
D O I
10.1021/nl050405n
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Nanostructures can be patterned with focused electron or ion beams in thin, stable, conformal films of water ice grown on silicon. We use these patterns to reliably fabricate sub-20 nm wide metal lines and exceptionally well-defined, sub-10 nanometer beam-induced chemical surface transformations. We argue more generally that solid-phase condensed gases of low sublimation energy are ideal materials for nanoscale patterning, and water, quite remarkably, may be among the most useful.
引用
收藏
页码:1157 / 1160
页数:4
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