Effect of Heat Treatment on the Microstructure and Residual Stresses in (Ti,Al)N Films

被引:19
|
作者
Yang, Ying [1 ]
Zhao, Shengsheng [1 ]
Gong, Jun [1 ]
Jiang, Xin [2 ]
Sun, Chao [1 ]
机构
[1] Chinese Acad Sci, Inst Met Res, State Key Lab Corros & Protect, Shenyang 110016, Peoples R China
[2] Univ Siegen, Inst Mat Engn, D-57076 Siegen, Germany
基金
中国国家自然科学基金;
关键词
Arc ion plating; Heat treatment; Microstructure; Stress distribution; (Ti; Al)N; 0.45; THIN-FILMS; MECHANICAL-PROPERTIES; HARD COATINGS; TIN FILMS; PVD; THICKNESS; EVAPORATION; DEPOSITION; GROWTH; TOOLS;
D O I
10.1016/S1005-0302(11)60079-0
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
(Ti,Al)N films were fabricated by arc on plating (AIP) and then annealed within a range of temperatures from 200 to 500 degrees C for 30 min in vacuum. The results indicate that the average residual stresses decrease slightly from -5.84 to -4.98 GPa with increasing annealing temperature. The stress depth distribution evolves from a sharp "bell" shape to a mild "bell" shape, suggesting a more uniform stress state in the annealed films. The microstructure of the films was also investigated in detail. The as-deposited film consists of fine columnar crystals with an amorphous phase at the interface. During heat treatment, the columnar subgrain growth was observed; meanwhile, the phenomenon of crystallization has been identified at the interface. Further more, the relationship between the residual stresses and the microstructure of the films was explored and highlighted. In addition, there is no hardness degradation of the films during heat treatment.
引用
收藏
页码:385 / 392
页数:8
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