A general model for chemical erosion of carbon materials due to low-energy H+ impact

被引：11

作者：

Liu, Shengguang ^{[1
]}

Sun, Jizhong ^{[1
]}

Dai, Shuyu ^{[1
]}

Stirner, Thomas ^{[2
]}

Wang, Dezhen ^{[1
]}

机构：

[1] Dalian Univ Technol, Sch Phys & Optoelect Technol, Minist Educ, Key Lab Mat Modificat Laser Ion & Elect Beams, Dalian 116024, Peoples R China

[2] Univ Appl Sci Deggendorf, D-94469 Deggendorf, Germany

来源：

JOURNAL OF APPLIED PHYSICS | 2010年 / 108卷 / 07期

关键词：

0001 GRAPHITE SURFACE; ION FLUX DENSITIES; HYDROCARBON FORMATION; PYROLYTIC-GRAPHITE; SPUTTERING YIELDS; PUMP LIMITER; ATOM IMPACT; TORE-SUPRA; HYDROGEN; BOMBARDMENT;

D O I：

10.1063/1.3485821

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Modeling the chemical erosion of carbon materials due to low-energy H+ impact is of paramount importance for the prediction of the behavior of carbon-based plasma-facing components in nuclear fusion devices. In this paper a simple general model describing both energy and temperature dependence of carbon-based chemical erosion is presented. Enlightened by Hopf's model {Hopf et al., [J. Appl. Phys. 94, 2373 (2003)}, the chemical erosion is separated into the contributions from three mechanisms: thermal chemical erosion, energetic chemical sputtering, and ion-enhanced chemical erosion. Using input from the Monte Carlo code TRIDYN, this model is able to reproduce experimental data well. (C) 2010 American Institute of Physics. [doi:10.1063/1.3485821]

引用

页数：7

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